PROPERTIES OF TA-AL FILMS REACTIVELY SPUTTERED IN AN ARGON-NITROGEN ATMOSPHERE

被引：2
|
作者：
SCHOEN, JM
GERSTENBERG, D
HARTWIG, CT
机构：
[1] BELL TEL LABS INC,HOLMDEL,NJ 07733
[2] BELL TEL LABS INC,ALLENTOWN,PA 18103
来源：
THIN SOLID FILMS | 1975年 / 28卷 / 02期
关键词：
D O I：
10.1016/0040-6090(75)90115-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：251 / 264
页数：14
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