ANALYSIS OF A MICROSTRIP STEP DISCONTINUITY FABRICATED ON A METAL-INSULATOR-SEMICONDUCTOR (MIS) SUBSTRATE

被引：2
|
作者：
LIVERNOIS, TG
EAST, JR
机构：
[1] Ford Motor Company Dearborn, Michigan
[2] Center for High Frequency Electronics, University of Michigan, Ann Arbor, Michigan
来源：
MICROWAVE AND OPTICAL TECHNOLOGY LETTERS | 1992年 / 5卷 / 13期
关键词：
MIS SUBSTRATE; COUPLED INTEGRAL EQUATIONS; MICROSTRIP DISCONTINUITY; SCATTERING PARAMETERS;
D O I：
10.1002/mop.4650051303
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A space-domain coupled integral equation analysis is used to compute the two-dimensional surface current distribution on a basic microstrip step discontinuity fabricated on an MIS substrate. The two-port scattering parameters are computed from the surface current and their accuracy is verified through comparison with a measured data.
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页码：661 / 666
页数：6
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