DETERMINATION OF IMPURITY DOPANT DISTRIBUTIONS IN DIAMOND FILMS BY SIMS

被引：0
|
作者：
BUCKLEYGOLDER, IM
CHALKER, PR
GLASS, JT
KOBASHI, K
NAKAUE, A
机构：
[1] HARWELL LAB,CTR MICROELECTR MAT,DIDCOT OX11 ORA,OXON,ENGLAND
[2] KOBE STEEL LTD,ELECTR RES LAB,NISHI KU,KOBE 67302,JAPAN
[3] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695
来源：
CARBON | 1990年 / 28卷 / 06期
关键词：
D O I：
10.1016/0008-6223(90)90311-L
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：801 / 801
页数：1
相关论文
共 50 条
  • [1] MEASUREMENT OF NARROW SI DOPANT DISTRIBUTIONS IN GAAS BY SIMS
    CLEGG, JB
    BEALL, RB
    SURFACE AND INTERFACE ANALYSIS, 1989, 14 (6-7) : 307 - 314
  • [2] ON THE DETERMINATION OF DOPANT CARRIER DISTRIBUTIONS
    VANDERVORST, W
    CLARYSSE, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01): : 302 - 315
  • [3] IMPURITY DISTRIBUTIONS IN ANODIC FILMS ON TANTALUM
    PAWEL, RE
    PEMSLER, JP
    EVANS, CA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (08) : C212 - &
  • [4] IMPURITY DISTRIBUTIONS IN ANODIC FILMS ON TANTALUM
    PAWEL, RE
    PEMSLER, JP
    EVANS, CA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (01) : 24 - +
  • [5] BACK-SIDE SIMS PROFILES OF DOPANT REDISTRIBUTION UNDER SILICIDE FILMS
    JACKMAN, JA
    KULAR, A
    WEAVER, L
    MAYER, D
    JACKMAN, TE
    MACPHERSON, C
    SURFACE AND INTERFACE ANALYSIS, 1990, 15 (07) : 451 - 453
  • [6] Altering resistivity in diamond films without impurity addition
    Baker, CC
    McNamara, KM
    AMORPHOUS AND NANOSTRUCTURED CARBON, 2000, 593 : 477 - 482
  • [7] Direct Imaging of Dopant and Impurity Distributions in 2D MoS2
    Kim, Se-Ho
    Lim, Joohyun
    Sahu, Rajib
    Kasian, Olga
    Stephenson, Leigh T.
    Scheu, Christina
    Gault, Baptiste
    ADVANCED MATERIALS, 2020, 32 (08)
  • [8] DETERMINATION OF DISTRIBUTIONS IN INHOMOGENEOUS FILMS
    MORRISSEY, BW
    MCCRACKIN, FL
    STROMBERG, RR
    JOURNAL OF COLLOID AND INTERFACE SCIENCE, 1973, 42 (01) : 198 - 200
  • [9] Quantitative investigation of boron incorporation in polycrystalline CVD diamond films by SIMS
    Kolber, T
    Piplits, K
    Haubner, R
    Hutter, H
    FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1999, 365 (08): : 636 - 641
  • [10] Quantitative investigation of boron incorporation in polycrystalline CVD diamond films by SIMS
    T. Kolber
    K. Piplits
    R. Haubner
    H. Hutter
    Fresenius' Journal of Analytical Chemistry, 1999, 365 : 636 - 641
12345