ELECTRICAL-RESISTIVITY OF AULN2 THIN-FILMS AT 4.2 K

被引：3

作者：

HASUMI, Y ^{[1
]}

ARAI, K ^{[1
]}

WAHO, T ^{[1
]}

YANAGAWA, F ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP,MUSASHINO ELECT COMMUN LAB,MUSASHINO,TOKYO 180,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 02期

关键词：

D O I：

10.1063/1.333102

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：471 / 475

页数：5

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