ELECTRICAL-RESISTIVITY OF ULTRA-THIN FILMS

被引:9
|
作者
KIERUL, J
LEDZION, J
机构
[1] Department of Solid State Physics, University of Łódź
来源
关键词
D O I
10.1002/pssa.2211280113
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The paper is devoted to a numerical study of the dc electrical conductivity for ultra-thin metallic films. The cluster approach of Stein and Krey based on the quantum-mechanical Kubo formula is employed. The dc conductivity is obtained as a function of film roughness and thickness. The results indicate how the experimentally observed decrease and the 1 ML period of the resistivity vs. thickness curve can be related to the properties of the film surface.
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页码:117 / 121
页数:5
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