FOCUSED BORON ION-BEAM IMPLANTATION INTO SILICON

被引：7
|
作者：
TAMURA, M
SHUKURI, S
ICHIKAWA, M
WADA, Y
ISHITANI, T
机构：
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1985年 / 7-8卷 / MAR期
关键词：
D O I：
10.1016/0168-583X(85)90483-5
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：858 / 863
页数：6
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