INSITU GROWTH OF YBCO HIGH-TC SUPERCONDUCTING THIN-FILMS BY PLASMA-ENHANCED METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：14
|
作者：
ZHAO, J
CHERN, CS
LI, YQ
NOH, DW
NORRIS, PE
ZAWADZKI, P
KEAR, B
GALLOIS, B
机构：
[1] RUTGERS STATE UNIV,PISCATAWAY,NJ 08854
[2] STEVENS INST TECHNOL LIB,HOBOKEN,NJ 07030
来源：
JOURNAL OF CRYSTAL GROWTH | 1991年 / 107卷 / 1-4期
关键词：
D O I：
10.1016/0022-0248(91)90544-F
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
Highly c-axis oriented, highly dense, low carbon YBa2Cu3O(x) superconducting thin films have been formed in-situ at a reduced substrate temperature as low as 570-degrees-C by a novel plasma enhanced metalorganic chemical vapor deposition process. Superconducting YBa2Cu3O(x) thin films, having a zero resistance transition temperature of 82 K and critical current density of 10(4) A/cm2 at 70 K, have been directly deposited on sapphire substrates by such a process.
引用
收藏
页码：699 / 704
页数：6
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