SUPERCONDUCTING YBA2CU3O7-X THIN-FILMS ON SILVER SUBSTRATES BY INSITU PLASMA-ENHANCED METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：27
|
作者：
ZHAO, J
LI, YQ
CHERN, CS
NORRIS, P
GALLOIS, B
KEAR, B
WESSELS, BW
机构：
来源：
APPLIED PHYSICS LETTERS | 1991年 / 58卷 / 01期
关键词：
D O I：
10.1063/1.104400
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
An in situ microwave plasma-enhanced metalorganic chemical vapor deposition process was used to fabricate highly c-axis oriented YBa2Cu3O7-x superconducting thin films on metallic Ag substrates. The films were deposited at a reduced substrate temperature of 740-degrees-C in about 270 Pa of N2O ambient. Magnetic susceptibilities versus temperature of the as-deposited films show attainment of zero resistance of 85 K and composition of single (high T(c)) phase. X-ray diffraction measurements reveal that the films deposited at 740-degrees-C have highly preferential orientation of the crystallite c axes perpendicular to the substrate surface.
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页码：89 / 91
页数：3
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