LOW-TEMPERATURE INSITU FORMATION OF Y-BA-CU-O HIGH-TC SUPERCONDUCTING THIN-FILMS BY PLASMA-ENHANCED METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：44
|
作者：
ZHAO, J
NOH, DW
CHERN, C
LI, YQ
NORRIS, P
GALLOIS, B
KEAR, B
机构：
来源：
APPLIED PHYSICS LETTERS | 1990年 / 56卷 / 23期
关键词：
D O I：
10.1063/1.103249
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Highly textured, highly dense, superconducting YBa2Cu 3O7-x thin films with mirror-like surfaces have been prepared, in situ, at a reduced substrate temperature as low as 570°C by a remote microwave plasma-enhanced metalorganic chemical vapor deposition process (PE-MOCVD). Nitrous oxide was used as the oxidizer gas. The as-deposited films grown by PE-MOCVD show attainment of zero resistance at 72 K. PE-MOCVD was carried out in a commercial scale MOCVD reactor.
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页码：2342 / 2344
页数：3
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