ION BEAM-ASSISTED ETCHING OF ALUMINUM WITH CHLORINE

被引：4
|
作者：
TSOU, LY [1 ]
机构：
[1] AT&T TECHNOL INC,PRINCETON,NJ 08540
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 08期
关键词：
D O I：
10.1149/1.2114271
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：2010 / 2012
页数：3
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