KINETICS OF OXYGEN PRECIPITATION IN DISLOCATION-FREE SILICON

被引：0
|
作者：
FREELAND, PE [1 ]
JACKSON, KA [1 ]
LOWE, CW [1 ]
PATEL, JR [1 ]
机构：
[1] BELL TEL LABS INC,MURRAY HILL,NJ
来源：
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1976年 / 21卷 / 03期
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D O I：
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中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
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页码：229 / 229
页数：1
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