KINETICS OF OXYGEN PRECIPITATION IN DISLOCATION-FREE SILICON

被引：0

作者：

FREELAND, PE ^{[1
]}

JACKSON, KA ^{[1
]}

LOWE, CW ^{[1
]}

PATEL, JR ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ

来源：

BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1976年 / 21卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：229 / 229

页数：1

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