共 50 条
- [22] PROXIMITY EFFECT REDUCTION IN HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY BY BIAS EXPOSURE METHOD JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 164 - 167
- [23] ELECTRON-BEAM OF A BETATRON WITH HIGH-VOLTAGE INJECTION IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII FIZIKA, 1972, (03): : 136 - +
- [24] Nanometer-scale pattern formation of GaAs by in situ electron-beam lithography using surface oxide layer as a resist film JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2777 - 2780
- [25] Nanometer-scale pattern formation of gaas by in situ electron-beam lithography using surface oxide layer as a resist film J Vac Sci Technol B Microelectron Nanometer Struct, 6 (2777-2780):
- [26] THE ELECTRON-BEAM COLUMN FOR A HIGH-DOSE AND HIGH-VOLTAGE ELECTRON-BEAM EXPOSURE SYSTEM EX-7 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 209 - 212
- [27] Nanometer biodevice fabrication by electron beam lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06): : 2892 - 2896
- [28] ELECTRON-BEAM LITHOGRAPHY FOR MICROCIRCUIT FABRICATION ELECTRONICS AND POWER, 1976, 22 (07): : 433 - 436
- [30] VERY HIGH-VOLTAGE (500 KV) ELECTRON-BEAM LITHOGRAPHY FOR THICK RESISTS AND HIGH-RESOLUTION JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 120 - 123