EXCIMER-LASER GAS-ASSISTED DEPOSITION OF CRYSTALLINE AND AMORPHOUS FILMS

被引：4
|
作者：
REDDY, KV
机构：
来源：
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS | 1986年 / 3卷 / 05期
关键词：
D O I：
10.1364/JOSAB.3.000801
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：801 / 805
页数：5
相关论文
共 50 条
  • [21] PATTERNING OF YBCO FILMS BY EXCIMER-LASER ABLATION
    PROYER, S
    STANGL, E
    SCHWAB, P
    BAUERLE, D
    SIMON, P
    JORDAN, C
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1994, 58 (05): : 471 - 474
  • [22] ELECTROLESS COPPER DEPOSITION ON EXCIMER-LASER PRETREATED ALUMINA
    FOLSER, F
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1994, 59 (02): : 209 - 213
  • [23] Excimer laser assisted deposition of metal films on aluminum nitride
    Lumpp, JK
    Li, H
    AlBanna, S
    IEEE/LEOS 1996 SUMMER TOPICAL MEETINGS - ADVANCED APPLICATIONS OF LASERS IN MATERIALS AND PROCESSING, DIGEST, 1996, : 61 - 62
  • [24] PREPARATION OF CATIO3 HETEROEPITAXIAL THIN-FILMS BY EXCIMER-LASER DEPOSITION
    FUJII, T
    FUJISHIMA, A
    HIRANO, T
    KOBAYASHI, T
    APPLIED PHYSICS LETTERS, 1993, 62 (24) : 3204 - 3206
  • [25] PULSED EXCIMER-LASER DEPOSITION OF SI1-XGEX THIN-FILMS
    ANTONI, F
    FOGARASSY, E
    FUCHS, C
    GROB, JJ
    PREVOT, B
    STOQUERT, JP
    APPLIED PHYSICS LETTERS, 1995, 67 (14) : 2072 - 2074
  • [26] DEPTH SELECTIVE ANALYSIS OF PHASES AND SPIN TEXTURES IN AMORPHOUS, NANOCRYSTALLINE AND CRYSTALLINE RIBBONS TREATED WITH AN EXCIMER-LASER
    RIXECKER, G
    SCHAAF, P
    GONSER, U
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1993, 26 (05) : 870 - 879
  • [27] EXCIMER-LASER ASSISTED CHEMICAL MACHINING OF SIC CERAMIC
    HIBI, Y
    ENOMOTO, Y
    KIKUCHI, K
    SHIKATA, N
    OGISO, H
    APPLIED PHYSICS LETTERS, 1995, 66 (07) : 817 - 818
  • [28] TRANSIENT OPTICAL-TRANSMISSION MEASUREMENT IN EXCIMER-LASER IRRADIATION OF AMORPHOUS-SILICON FILMS
    PARK, HK
    XU, X
    GRIGOROPOULOS, CP
    DO, N
    KLEES, L
    LEUNG, PT
    TAM, AC
    JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME, 1993, 115 (01): : 178 - 183
  • [29] PHASE-TRANSFORMATION MECHANISMS INVOLVED IN EXCIMER-LASER CRYSTALLIZATION OF AMORPHOUS-SILICON FILMS
    IM, JS
    KIM, HJ
    THOMPSON, MO
    APPLIED PHYSICS LETTERS, 1993, 63 (14) : 1969 - 1971
  • [30] Melting and crystallization behavior of low-pressure chemical-vapor-deposition amorphous Si films during excimer-laser annealing
    Voogt, FC
    Ishihara, R
    Tichelaar, FD
    JOURNAL OF APPLIED PHYSICS, 2004, 95 (05) : 2873 - 2879
12345