QUANTITATIVE DETECTION OF OXYGEN IN SILICON-NITRIDE ON SILICON

被引：53

作者：

HOLLOWAY, PH ^{[1
]}

STEIN, HJ ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 05期

关键词：

D O I：

10.1149/1.2132916

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：723 / 728

页数：6

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