THE EFFECT OF TI-W BARRIER METAL ON CHARACTERISTICS OF PALLADIUM-SILICIDE SCHOTTKY-BARRIER DIODES

被引：3

|

作者：

DROBNY, VF

机构：

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1985年 / 14卷 / 03期

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D O I：

10.1007/BF02661223

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

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页码：283 / 296

页数：14

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