CHARACTERISTICS OF RADIOFREQUENCY SILICON-CARBIDE FILMS

被引：16

|

作者：

RAVEH, A

INSPEKTOR, A

CARMI, U

AVNI, R

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 05期

关键词：

D O I：

10.1116/1.574317

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：2836 / 2841

页数：6

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