THE DEVELOPMENT OF SOR LITHOGRAPHY TECHNOLOGY

被引：0
|
作者：
ISHIHARA, S [1 ]
机构：
[1] NIPPON TELEGRAPH & TEL PUBL CORP, LARGE SCALE INTEGRAT LABS, MICROFABRICAT TECHNOL LAB, CHIYODA KU, TOKYO 10019, JAPAN
来源：
NTT REVIEW | 1995年 / 7卷 / 04期
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
NTT's synchrotron x-ray lithography technology has achieved the target performance feasible for future micro-fabrication, which is now available for test LSI fabrication. This paper reviews NTT Laboratories' research and development of x-ray lithography during the last ten years since the application of synchrotron orbital radiation (SOR). The historical background of x-ray lithography research, NTT's research programs on synchrotron x-ray lithography (SOR lithography), and the current status of the research are overviewed. The paper concludes with a report on the achieved performance of the technology.
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页码：18 / 25
页数：8
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