Research development of laser lithography technology

被引：0
|
作者：
Deng, Changmeng [1 ,2 ]
Geng, Yongyou [1 ]
Wu, Yiqun [1 ,3 ]
机构：
[1] Key Laboratory of Material Science and Technology for High Power Lasers, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
[2] Graduate University of the Chinese Academy of Sciences, Beijing 100049, China
[3] Key Laboratory of Functional Inorganic Material Chemistry(Heilongjiang University), Ministry of Education, Harbin 150080, China
来源：
Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering | 2012年 / 41卷 / 05期
关键词：
Application prospect - Development trends - Mask-less lithography - Next generation lithography - Projection lithography - Research development - Semiconductor industry - Technology challenges;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：1223 / 1231
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