Application of Laser Heterodyne Interference Technology in Lithography

被引：7
|
作者：
Zhang Zhiping [1 ]
Yang Xiaofeng [1 ]
机构：
[1] Fudan Univ, Acad Engn & Technol, Shanghai Engn Res Ctr Ultraprecis Mot Control & M, Shanghai 201203, Peoples R China
来源：
LASER & OPTOELECTRONICS PROGRESS | 2022年 / 59卷 / 09期
关键词：
lithography machine; heterodyne interference; dual frequency laser interferometer; 2D grating; INTERFEROMETER; COMPENSATION; ERROR;
D O I：
10.3788/LOP202259.0922017
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Ultra-precision displacement measurement system is one of the indispensable key subsystems of the lithography machine. The ultra-precision displacement measurement system based on laser heterodyne interference technology has the advantages of sub nano resolution, nano precision, meter range and measurement speed of several meters per second. It is so far the only displacement measurement system that can meet the requirements of the lithography machine. At present, there are two kinds of ultra-precision displacement measurement systems used in lithography: dual frequency laser interferometer and plane grating measurement system, both of which are based on laser heterodyne interference technology. In this paper, the principles, advantages and disadvantages of the two measurement systems and their typical applications in lithography are described.
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页数：8
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