THE CHEMICAL SPUTTERING OF SILICA BY AR+ IONS AND XEF2

被引：18

作者：

LOUDIANA, MA ^{[1
]}

SCHMID, A ^{[1
]}

DICKINSON, JT ^{[1
]}

ASHLEY, EJ ^{[1
]}

机构：

[1] USN,CTR WEAP,CHINA LAKE,CA 93555

来源：

SURFACE SCIENCE | 1984年 / 141卷 / 2-3期

关键词：

D O I：

10.1016/0039-6028(84)90140-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：409 / 416

页数：8

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