PHOTODISSOCIATION OF XEF2 AT 193 NM

被引:7
|
作者
BOTT, JF
HEIDNER, RF
HOLLOWAY, JS
KOFFEND, JB
机构
[1] Aerophysics Laboratory, Laboratory Operations, The Aerospace Corporation, Los Angeles, CA 90009
关键词
D O I
10.1016/0301-0104(90)89034-N
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The absorption coefficient of XeF2 has been measured at 193, 206, and 253 nm. The measurements have been compared with those of Black et al. and Jortner et al. The present measurements of XeF2 absorption at 193 and 253 nm appear to resolve the discrepancy in those absorption measurements. Adjusting the data of these two previous investigations to match our values at these two wavelengths brings the two sets of measured absorption coefficients into agreement in the overlapping wavelength interval, 203-210 nm. We determined experimentally that one molecule of XeF2 is dissociated for each photon absorbed at 193 nm. © 1990.
引用
收藏
页码:411 / 416
页数:6
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