RAPID THERMAL-PROCESSING OF HIGH-QUALITY SILICON DIOXIDE FILMS

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作者：
NULMAN, J
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来源：
SOLID STATE TECHNOLOGY | 1986年 / 29卷 / 04期
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码：189 / 191
页数：3
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