CHARACTERIZATION OF AMORPHOUS-SILICON BARRIERS IN NB3GE JOSEPHSON TUNNEL-JUNCTIONS

被引：2
|
作者：
NOYA, A [1 ]
KONISHI, H [1 ]
KURIKI, S [1 ]
机构：
[1] HOKKAIDO UNIV,APPL ELECT RES INST,SAPPORO,HOKKAIDO 060,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1986年 / 25卷 / 02期
关键词：
D O I：
10.1143/JJAP.25.287
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：287 / 288
页数：2
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