OXIDIZED AMORPHOUS-SILICON SUPERCONDUCTING TUNNEL JUNCTION BARRIERS

被引：63
|
作者：
RUDMAN, DA
BEASLEY, MR
机构：
[1] STANFORD UNIV,DEPT APPL PHYS,STANFORD,CA 94305
[2] STANFORD UNIV,DEPT ELECTR ENGN,STANFORD,CA 94305
来源：
APPLIED PHYSICS LETTERS | 1980年 / 36卷 / 12期
关键词：
D O I：
10.1063/1.91666
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1010 / 1013
页数：4
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