INSITU IR SPECTROSCOPIC STUDY OF A-SI-H THIN-FILMS UNDER PHOTOCHEMICAL VAPOR-DEPOSITION CONDITIONS

被引：0

作者：

WADAYAMA, T ^{[1
]}

SUETAKA, W ^{[1
]}

机构：

[1] TOHOKU UNIV,FAC ENGN,DEPT MAT SCI,SENDAI,MIYAGI 980,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C444 / C444

页数：1

共 50 条

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