INSITU IR SPECTROSCOPIC STUDY OF A-SI-H THIN-FILMS UNDER PHOTOCHEMICAL VAPOR-DEPOSITION CONDITIONS

被引：0
|
作者：
WADAYAMA, T [1 ]
SUETAKA, W [1 ]
机构：
[1] TOHOKU UNIV,FAC ENGN,DEPT MAT SCI,SENDAI,MIYAGI 980,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期
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D O I：
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中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C444 / C444
页数：1
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