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- [5] Stoichiometry of Ta-N film and its application for diffusion barrier in the Al3Ta/Ta-N/Si contact system Sasaki, Katsutaka, 1600, (29):
- [7] STOICHIOMETRY OF TA-N FILM AND ITS APPLICATION FOR DIFFUSION BARRIER IN THE AL3TA/TA-N/SI CONTACT SYSTEM JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (06): : 1043 - 1047