共 50 条
- [1] STOICHIOMETRY OF TA-N FILM AND ITS APPLICATION FOR DIFFUSION BARRIER IN THE AL3TA/TA-N/SI CONTACT SYSTEM JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (06): : 1043 - 1047
- [9] Auger electron spectroscopy study on the stability and the interfacial reaction of Ta, Ta-N and TaN films as a diffusion barrier between Cu9Al4 film and Si Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1993, 32 (02): : 911 - 915