Stoichiometry of Ta-N film and its application for diffusion barrier in the Al3Ta/Ta-N/Si contact system

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[1] Sasaki, Katsutaka
[2] Noya, Atsushi
[3] Umezawa, Toshiji
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Sasaki, Katsutaka | 1600年 / 29期
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Semiconducting Silicon;
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