REFRACTIVE-INDEX PROFILES INDUCED BY ION-IMPLANTATION INTO SILICA

被引：69

作者：

WEBB, AP ^{[1
]}

TOWNSEND, PD ^{[1
]}

机构：

[1] UNIV SUSSEX,SCH MATH & PHYS SCI,BRIGHTON BN1 9QH,SUSSEX,ENGLAND

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1976年 / 9卷 / 09期

关键词：

D O I：

10.1088/0022-3727/9/9/011

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1343 / 1354

页数：12

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