REFRACTIVE-INDEX PROFILES INDUCED BY ION-IMPLANTATION INTO SILICA

被引：69
|
作者：
WEBB, AP [1 ]
TOWNSEND, PD [1 ]
机构：
[1] UNIV SUSSEX,SCH MATH & PHYS SCI,BRIGHTON BN1 9QH,SUSSEX,ENGLAND
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1976年 / 9卷 / 09期
关键词：
D O I：
10.1088/0022-3727/9/9/011
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1343 / 1354
页数：12
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