STRUCTURE AND DYNAMICS OF STRONG CHEMISORPTION ON SI(111) AS MEASURED WITH ATOMIC HELIUM SCATTERING

被引：18
|
作者：
DOAK, RB
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 05期
关键词：
D O I：
10.1116/1.584470
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：1252 / 1259
页数：8
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