PLASMA-ETCHING OF GAAS WITH CCL2F2 AND ADDITIVE GASES

被引：0
|
作者：
FORTE, AR [1 ]
RATHMAN, DD [1 ]
MAHONEY, LJ [1 ]
机构：
[1] MIT,LINCOLN LAB,LEXINGTON,MA 02173
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 09期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
下载
收藏
页码：C403 / C403
页数：1
相关论文
共 50 条
  • [31] ADDITIVE TRACERS FOR RESIST PLASMA-ETCHING
    CHEAIB, M
    SADEGHI, N
    SCHILTZ, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02): : 273 - 277
  • [32] HYDROGEN PLASMA-ETCHING OF GAAS OXIDE
    CHANG, RPH
    DARACK, S
    APPLIED PHYSICS LETTERS, 1981, 38 (11) : 898 - 900
  • [33] ALKANE BASED PLASMA-ETCHING OF GAAS
    LAW, VJ
    TEWORDT, M
    INGRAM, SG
    JONES, GAC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (03): : 1449 - 1455
  • [34] DIFFUSION-COEFFICIENTS OF THE HALOCARBONS CCL2F2 AND C2CL2F4 WITH SIMPLE GASES
    MONFORT, JP
    PELLEGATTA, JL
    JOURNAL OF CHEMICAL AND ENGINEERING DATA, 1991, 36 (02): : 135 - 137
  • [35] ABSOLUTE VISCOSITY OF CCL2F2 AND CHCL2F
    LATTO, B
    ALSALOUM, AJ
    JOURNAL OF MECHANICAL ENGINEERING SCIENCE, 1970, 12 (02): : 135 - +
  • [36] PLASMA-ETCHING OF NIOBIUM WITH CF4/O2 GASES
    CHEN, MM
    WANG, RH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 708 - 711
  • [37] CHARACTERIZATION OF THE N-GAAS SURFACE AFTER CF-4, SF6, CCL2F2, AND CCL2F2-O2 PLASMA TREATMENT BY PHOTOREFLECTANCE
    DITTRICH, T
    JOHN, S
    JOHN, W
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1991, 128 (02): : 435 - 446
  • [38] Ionization of CCl4 and CCl2F2 by electron impact
    Lindsay, B. G.
    McDonald, K. F.
    Yu, W. S.
    Stebbings, R. F.
    Yousif, F. B.
    PLASMA AND FUSION SCIENCE, 2006, 875 : 215 - +
  • [39] Dry etching of AlxGa1-xN/GaN by CCl2F2 chemistry for device isolation
    Lau, WS
    Singh, BP
    Tan, JBH
    Gunawan, S
    Jiang, YY
    Wynn, RT
    Lim, VSW
    Trigg, AD
    Physica Status Solidi C - Conferences and Critical Reviews, Vol 2, No 7, 2005, 2 (07): : 2544 - 2547
  • [40] Trends of atmospheric CCL3F, CCL2F2 and CCL2FCCLF2 in Shanghai (China)
    Yue, Y
    Limin, C
    Guozhong, S
    Libo, W
    Weichun, M
    INTERNATIONAL JOURNAL OF ENVIRONMENTAL ANALYTICAL CHEMISTRY, 2002, 82 (02) : 61 - 68
12345