REPAIR OF X-RAY-LITHOGRAPHY MASKS USING UV-LASER PHOTODEPOSITION

被引：12
|
作者：
RANDALL, JN
EHRLICH, DJ
TSAO, JY
机构：
[1] MIT, Lincoln Lab, Lexington, MA, USA, MIT, Lincoln Lab, Lexington, MA, USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期
关键词：
D O I：
10.1116/1.583241
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
8
引用
收藏
页码：262 / 264
页数：3
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