USE OF STENCIL MASKS IN X-RAY-LITHOGRAPHY

被引：0
|
作者：
ALEKSANDROV, YM
VALIEV, KA
VELIKOV, LV
DUSHENKOV, SD
MAKHMUTOV, RK
YAKIMENKO, MN
机构：
来源：
SOVIET MICROELECTRONICS | 1986年 / 15卷 / 01期
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暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：42 / 45
页数：4
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