RESIDUAL-GAS BEAM PROFILE MONITOR

被引:16
|
作者
KRIDER, J
机构
关键词
D O I
10.1016/0168-9002(89)91188-1
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:660 / 663
页数:4
相关论文
共 50 条
  • [41] PULSED GAS INJECTION FOR ONLINE CALIBRATION OF RESIDUAL-GAS ANALYZERS
    KENDALL, BRF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (01): : 143 - 148
  • [42] Optical beam profile monitor and residual gas fluorescence at the relativistic heavy ion collider polarized hydrogen jet
    Tsang, T.
    Bellavia, S.
    Connolly, R.
    Gassner, D.
    Makdisi, Y.
    Russo, T.
    Thieberger, P.
    Trbojevic, D.
    Zelenski, A.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2008, 79 (10):
  • [43] USE OF GASB FILMS AS RESIDUAL-GAS PRESSURE MONITORS
    PATEL, SM
    MAHAJAN, MD
    JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1981, 14 (03): : 378 - 380
  • [44] GLASS-ENCLOSED QUADRUPOLE RESIDUAL-GAS ANALYZER
    SWINGLER, DL
    VACUUM, 1971, 21 (1-2) : 17 - &
  • [45] A RESIDUAL-GAS ANALYZER COMPATIBLE WITH REACTIVE AND RADIOACTIVE GASES
    VONSEGGERN, J
    BERGER, S
    ERDWEG, M
    HOFER, WO
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1984, 2 (04): : 1516 - 1520
  • [46] THE INFLUENCE OF RESIDUAL-GAS ON THE PROPERTIES OF EVAPORATED SELENIUM FILMS
    SZABO, JP
    SEARS, WM
    COLBOW, K
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1990, 5 (07) : 695 - 701
  • [47] PRESENT STATUS OF QUANTITATIVE RESIDUAL-GAS ANALYSIS IN JAPAN
    ONO, M
    VACUUM, 1985, 35 (12) : 636 - 636
  • [48] USE OF RESIDUAL-GAS ANALYZERS ON INDUSTRIAL VACUUM FURNACES
    不详
    METALLURGIA, 1986, 53 (07): : 273 - 274
  • [49] NITROSAMINE PROBLEM IN REMOVAL OF AMINE RESIDUAL-GAS BY COMBUSTION
    HEBERER, H
    KASCHE, J
    DIETZSCH, K
    BITTERSOHL, G
    ZEITSCHRIFT FUR CHEMIE, 1981, 21 (03): : 119 - 119
  • [50] THE REACTION OF SPUTTERED FETI WITH UHV RESIDUAL-GAS STUDIED BY XPS
    POLAK, M
    HEFETZ, M
    MINTZ, MH
    DARIEL, MP
    SURFACE SCIENCE, 1983, 126 (1-3) : 739 - 744