THE DETECTION AND EVALUATION OF HEAVY-METAL CONTAMINATION IN SILICON-WAFERS

被引：0
|
作者：
GOODMAN, LA [1 ]
GOSSENBERGER, HF [1 ]
GOODMAN, AM [1 ]
机构：
[1] RCA CORP LABS,PRINCETON,NJ 08540
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 06期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C239 / C239
页数：1
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