THE DETECTION AND EVALUATION OF HEAVY-METAL CONTAMINATION IN SILICON-WAFERS

被引：0

|

作者：

GOODMAN, LA ^{[1
]}

GOSSENBERGER, HF ^{[1
]}

GOODMAN, AM ^{[1
]}

机构：

[1] RCA CORP LABS,PRINCETON,NJ 08540

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 06期

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D O I：

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中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：C239 / C239

页数：1

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