THE DETECTION AND EVALUATION OF HEAVY-METAL CONTAMINATION IN SILICON-WAFERS

被引：0

作者：

GOODMAN, LA ^{[1
]}

GOSSENBERGER, HF ^{[1
]}

GOODMAN, AM ^{[1
]}

机构：

[1] RCA CORP LABS,PRINCETON,NJ 08540

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 06期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C239 / C239

页数：1

共 50 条

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