ANOMALOUS MIGRATION OF ION-IMPLANTED AL IN SI

被引：23
|
作者：
DIETRICH, HB [1 ]
WEISENBERGER, WH [1 ]
COMAS, J [1 ]
机构：
[1] USN,RES LAB,WASHINGTON,DC 20375
来源：
APPLIED PHYSICS LETTERS | 1976年 / 28卷 / 04期
关键词：
D O I：
10.1063/1.88716
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：182 / 184
页数：3
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