GROWTH OF CUBIC (100) SRTIO3 THIN-FILMS BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION USING A NOVEL TITANIUM PRECURSOR

被引：10
|
作者：
HOLZSCHUH, H
SUHR, H
机构：
[1] Institute of Organic Chemistry, University of Tübingen, Tübingen, W-7400
来源：
ADVANCED MATERIALS | 1992年 / 4卷 / 05期
关键词：
D O I：
10.1002/adma.19920040509
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Communication: Plasma-enhanced CVD has been used, together with a new titanium precursor (see Figure), for the deposition of epiaxed (100) SrTiO3 thin films at a growth temperature of 500-degrees-C. In technical applications (100) SrTiO3 thin films have been found to be the ideal substrate for the growth of "1-2-3-" superconductors due to the perfect lattice match. The new precursor is easy to synthesize and handle, and is stable against air and moisture.
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页码：357 / 359
页数：3
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