ANALYSIS OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED SILICON-NITRIDE BY RUTHERFORD BACKSCATTERING SPECTROMETRY

被引：9
|
作者：
HWANG, HL
HWU, CC
LIUE, JC
LIH, HH
机构：
[1] IND TECHNOL RES INST,ELECTR RES & SERV ORG,IC DEV CTR,HSINCHU,TAIWAN
[2] INST NUCL ENERGY RES,TAOYUAN,TAIWAN
来源：
APPLIED PHYSICS LETTERS | 1982年 / 41卷 / 09期
关键词：
D O I：
10.1063/1.93714
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：844 / 846
页数：3
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