X-RAY-SENSITIVE RESISTS FOR SUB-MICRON LITHOGRAPHY

被引：0

作者：

ALEKSANDROV, YM

VALIEV, KA

VELIKOV, LV

GLEBOVA, OS

GRIBOV, BS

DUSHENKOV, SD

MOZZHUKHIN, DD

PLESHIVTSEV, AS

SELIVANOV, GK

YAKIMENKO, MN

机构：

来源：

SOVIET MICROELECTRONICS | 1983年 / 12卷 / 01期

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D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1 / 8

页数：8

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