INSITU STUDY OF FILM STRESS AND KINETICS OF PLATINUM SILICIDE FORMATION ON SILICON

被引：10
|
作者：
PAN, JT
BLECH, IA
机构：
来源：
THIN SOLID FILMS | 1984年 / 113卷 / 02期
关键词：
D O I：
10.1016/0040-6090(84)90021-X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：129 / 134
页数：6
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