THE EFFECTS OF DEPOSITION PARAMETERS, IMPURITIES, AND ADDITIONAL GASES ON LPCVD TUNGSTEN DEPOSITION

被引：0

作者：

SUMIYA, T ^{[1
]}

HIRASE, I ^{[1
]}

RUFIN, D ^{[1
]}

UKISHIMA, S ^{[1
]}

SCHACK, M ^{[1
]}

SHISHIKURA, M ^{[1
]}

MATSUURA, M ^{[1
]}

ITO, A ^{[1
]}

机构：

[1] ULVAC,TEISAN,AIR LIQUIDE LABS,TSUKUBA RES CONSORTIUM,TOYOSATO,IBARAKI 30026,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C477 / C477

页数：1

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