THE EFFECTS OF DEPOSITION PARAMETERS, IMPURITIES, AND ADDITIONAL GASES ON LPCVD TUNGSTEN DEPOSITION

被引：0
|
作者：
SUMIYA, T [1 ]
HIRASE, I [1 ]
RUFIN, D [1 ]
UKISHIMA, S [1 ]
SCHACK, M [1 ]
SHISHIKURA, M [1 ]
MATSUURA, M [1 ]
ITO, A [1 ]
机构：
[1] ULVAC,TEISAN,AIR LIQUIDE LABS,TSUKUBA RES CONSORTIUM,TOYOSATO,IBARAKI 30026,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C477 / C477
页数：1
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