NUMERICAL-SIMULATION OF STATIC AND DYNAMIC CHARACTERISTICS OF DUAL-GATE METAL-OXIDE-SEMICONDUCTOR THYRISTOR

被引:0
|
作者
IWAMURO, N
SEKI, Y
机构
[1] Fuji Electric Corporate R D Ltd., Advanced Device Technology Laboratory, Matsumoto-shi, Nagano, 390
来源
关键词
POWER SEMICONDUCTOR DEVICES; MOS-GATED THYRISTORS; VERTICAL STRUCTURE; IGBTS; DUAL-GATE OPERATION; LOW ONSTATE VOLTAGE DROP; FAST SWITCHING SPEED;
D O I
10.1143/JJAP.34.L285
中图分类号
O59 [应用物理学];
学科分类号
摘要
Static and dynamic characteristics of a newly proposed vertical metal oxide semiconductor (MOS)-gated thyristor structure called the dual-gate MOS thyristor (DGMOT) are reported for the first time. The feature of this device is that IGBT mode turn-off is achieved due to a novel integration of a lateral n-metal oxide semiconductor field effect transistor (MOSFET) with the thyristor structure while the thyristor mode operation is achieved in the on state. It is possible to obtain a lower on-state voltage drop in the DGMOT while preserving its fast turn-off speed. It has been numerically demonstrated using 600 V forward blocking devices that the on-state voltage drop of 1.04 V and the turn-off time of 0.40 mu s are achieved. This result suggests that the DGMOT could be a superior alternative to the power bipolar junction transistor and may expand the application fields of the MOS-gated devices to the low-frequency operation circuit.
引用
收藏
页码:L285 / L287
页数:3
相关论文
共 50 条
  • [41] Transient capacitance in metal-oxide-semiconductor structures with stacked gate dielectrics
    Goto, M
    Higuchi, K
    Torii, K
    Hasunuma, R
    Yamabe, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (11B): : 7826 - 7830
  • [42] ETHANOL SENSITIVITY OF PALLADIUM-GATE METAL-OXIDE-SEMICONDUCTOR STRUCTURES
    ACKELID, U
    ARMGARTH, M
    SPETZ, A
    LUNDSTROM, I
    IEEE ELECTRON DEVICE LETTERS, 1986, 7 (06) : 353 - 355
  • [43] Impact of gate microstructure on complementary metal-oxide-semiconductor transistor performance
    Yu, Bin
    Ju, Dong-Hyuk
    Kepler, Nick
    King, Tsu-Jae
    Hu, Chenming
    Japanese Journal of Applied Physics, Part 2: Letters, 1997, 36 (9 A-B):
  • [44] Gas sensing properties of copper gate metal-oxide-semiconductor capacitors
    Filippini, D
    Aragón, R
    Weimar, U
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (03): : 825 - 828
  • [45] Explanation for the temperature dependence of the gate current in metal-oxide-semiconductor transistors
    Ghetti, A
    APPLIED PHYSICS LETTERS, 2002, 80 (11) : 1939 - 1941
  • [46] NO2 sensitive Au gate metal-oxide-semiconductor capacitors
    Filippini, D
    Aragón, R
    Weimar, U
    JOURNAL OF APPLIED PHYSICS, 2001, 90 (04) : 1883 - 1886
  • [47] Impact of gate microstructure on complementary metal-oxide-semiconductor transistor performance
    Yu, B
    Ju, DH
    Kepler, N
    King, TJ
    Hu, CM
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1997, 36 (9AB): : L1150 - L1152
  • [48] Transient capacitance in metal-oxide-semiconductor structures with stacked gate dielectrics
    Goto, M., 1600, Japan Society of Applied Physics (43):
  • [49] HYDROGEN INDUCED DRIFT IN PALLADIUM GATE METAL-OXIDE-SEMICONDUCTOR STRUCTURES
    NYLANDER, C
    ARMGARTH, M
    SVENSSON, C
    JOURNAL OF APPLIED PHYSICS, 1984, 56 (04) : 1177 - 1188
  • [50] SEMINUMERICAL SIMULATION OF DISPERSIVE TRANSPORT IN THE OXIDE OF METAL-OXIDE-SEMICONDUCTOR DEVICES
    LATHI, S
    DAS, A
    JOURNAL OF APPLIED PHYSICS, 1995, 77 (08) : 3864 - 3867