DISTRIBUTION OF DOPANT IN SIO2-SI

被引：3
|
作者：
AVRON, M
SHATZKES, M
BURKHARDT, PJ
CADOFF, I
机构：
[1] IBM CORP,DIV SYST PROD,HOPEWELL JUNCTION,NY 12533
[2] POLYTECH INST BROOKLYN,DEPT MET & MAT SCI,BROOKLYN,NY 11201
来源：
JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 07期
关键词：
D O I：
10.1063/1.323110
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：3159 / 3166
页数：8
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