DEVELOPMENT OF MICROSTRIP GAS CHAMBERS WITH MULTICHIP TECHNOLOGY

被引：25
|
作者：
NAGAE, T
TANIMORI, T
KOBAYASHI, T
MIYAGI, T
机构：
[1] TOKYO INST TECHNOL,DEPT PHYS,MEGURO KU,TOKYO 152,JAPAN
[2] RIKEN,WAKO,SAITAMA 35101,JAPAN
[3] TOSHIBA CO LTD,CTR RES & DEV,KAWASAKI 210,JAPAN
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 1992年 / 323卷 / 1-2期
关键词：
D O I：
10.1016/0168-9002(92)90295-F
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
We have developed the microstrip gas chamber (MSGC) by using multi-chip technology which supports high-density assembly of bare LSI chips on a silicon wafer. Our MSGC was operated steadily with approximately 10(3) gain more than one week. An energy resolution of 15% for 5.9 keV X-ray of a Fe-55 source was obtained. With a very thin polyimide substrate of 16 mum thickness, two interesting phenomena were observed; one was a strong dependence of gains on backplane potential, and the other was little time variation of gains. We also found that a guard mask of a thin polyimide layer on the cathode edge reduced incidental electrical discharges between anode and cathode strips.
引用
收藏
页码：236 / 239
页数：4
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